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2025-02-20

Huahong Grace / NARUA... Domestic Semiconductor Patents Accelerate "Breakthrough"

Recently, several Chinese semiconductor companies, including Huahong Grace, Silan Microelectronics, H3C, JCET, NARUA, and BYD Semiconductor, have intensively announced technology patents covering key areas such as chip manufacturing, packaging, power management, material applications, and smart devices. These patents reflect the companies' significant breakthroughs in specialized technologies and further highlight the transformation of China's semiconductor industry from "catching up" to "keeping pace."




(I)Domestic Semiconductor Patents Achieving Breakthroughs Across Multiple Fronts


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Process Optimization: Dual Improvement of Yield and Reliability


Huahong Grace's "Method for Improving Chip Yield and Reliability" addresses yield loss caused by process fluctuations in wafer manufacturing by dynamically adjusting programming voltage. This technology uses real-time threshold voltage monitoring combined with two yield tests and a voltage adjustment formula to dynamically adapt process parameters. Compared to traditional fixed programming voltage solutions, this approach can improve yield by approximately 5%-10%, particularly in the manufacturing of high-density memory chips.

JCET's "Packaging Structure and Its Formation Method" achieves a breakthrough in heat dissipation: by designing grooves on the back of the chip and covering them with high thermal conductivity materials, the heat dissipation contact area is increased by over 20%. This innovation directly addresses the high power consumption challenges of 5G and AI chips, providing a new solution for the packaging reliability of domestic high-performance chips.


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Material Breakthroughs: Acceleration of Domestic Silicon Carbide Technology


Silicon carbide (SiC), as a core material for third-generation semiconductors, has seen significant progress in technology localization. Tianke Heda's "Silicon Carbide Wafer Transfer Device" resolves the contamination and efficiency issues in traditional transfer processes through a dual-platform lifting and locking structure, achieving a yield rate of over 99.5%. GREE's SiC Schottky device patent optimizes the doping concentration distribution, reducing forward conduction losses while improving breakdown voltage, thus filling the gap in domestic high-power SiC devices.


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System Design: Advancements in Intelligence and Integration


Hesai "AI Device Power Supply Control Circuit" integrates soft-start and over-voltage protection functions into a single module, dynamically adjusting switching frequencies to balance circuit safety and energy efficiency. NARUA "RF Power Synthesis Device" enables power synthesis and impedance matching of multiple amplifier modules without altering the original RF power supply architecture, providing technical support for the miniaturization of 5G base station equipment.


The "Chip Dual-Mode Interconnection" solutions proposed by TsingMicro and BOE use interface logic reuse to reduce hardware redundancy in chip-to-chip communication, achieving over a 30% reduction in power consumption. These technologies hold significant value for the low-power demands of autonomous driving and IoT devices.


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Testing and Manufacturing: Dual Upgrades in Efficiency and Precision


CHIPSEA's "Clock Signal Generation Circuit" uses oscillation signal feedback to dynamically adjust bias currents, reducing the startup time of crystal oscillators to the microsecond level while lowering steady-state power consumption by 40%. H3C's "FPGA Test Data Acquisition Method" improves test data acquisition efficiency by 50% through delay collection and RAM storage optimization, significantly reducing research and development debugging costs.



(II) China’s Semiconductor Industry: Transition from "Policy-Driven" to "Technology-Driven"



China’s semiconductor industry is transitioning from a "policy-driven" model to a "technology-driven" one. According to industry data, the Chinese semiconductor market is accelerating its growth, with notable development achievements. However, the domestic localization rate of core technologies and key products remains low. The recent surge in patent filings reflects both the industry's technological accumulation and exposes structural weaknesses within the supply chain.

Over the past five years, China has still relied on imports for "bottleneck" areas such as EDA tools and photoresists. However, the country has developed local advantages in packaging and testing, power devices, and memory chips. For example, Silan Microelectronics' buck converter technology has entered the international automotive electronics supply chain. Among the recent patents, BYD Semiconductor’s "Power Devices" have improved breakdown resistance through the design of deep voltage-dividing grooves, reaching the first-tier international standard, marking the penetration of domestic power semiconductors into the high-end market.

Taking silicon carbide as an example, TankeBlue's wafer transfer device, GREE's Schottky devices, and UnilC’s ultra-barrier rectifier patent form a complete technology chain from material processing to device design. This upstream and downstream collaborative innovation model is breaking the technological monopoly of overseas companies. Additionally, OneMicro Semiconductor's "Robot Obstacle Avoidance Method" integrates laser point cloud and map data to provide algorithmic support for the intelligent upgrade of domestic semiconductor manufacturing equipment.

Despite significant technological progress, Chinese semiconductor companies still face two major challenges: first, export restrictions on high-end equipment like photolithography machines and ion implanters; second, international giants using patent barriers to consolidate their market positions. According to industry data, U.S.-based App



(III) Conclusion



The continuous breakthroughs in domestic semiconductor technologies mark the industry’s shift from "scale expansion" to "quality improvement." However, technological breakthroughs are only the beginning. The real challenge lies in building a sustainable innovation ecosystem. Industry experts suggest that on the technological front, investment in the research and development of foundational materials and core equipment needs to be strengthened, such as accelerating the localization of EUV photoresists and high-purity silane gas. On the industrial front, deep collaboration across design, manufacturing, and packaging stages should be promoted to avoid resource waste caused by fragmented efforts. On the policy front, the intellectual property protection system should be improved, encouraging companies to engage in international competition through cross-licensing of patents.

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